Semiconductor and Electronics

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  • Achilles - Multilayer Cushions

    Achilles – Multilayer Cushions

    The cushions are the main protection placed inside the wafer carriers and absorbing external chocks and internal moves of the wafers stack. They are compatible with 4“, 5“, 6“, 8“ and 12“ wafers, and exist with different thicknesses: 3mm…

    The cushions are the main protection placed inside the wafer carriers and absorbing external chocks and internal moves of the wafers stack. They are compatible with 4“, 5“, 6“, 8“ and 12“ wafers, and exist with different thicknesses: 3mm, 5mm and 6mm.

    Their multi-layer structure improves their mechanical performances and offers a high purity grade. One thick PE core is covered with PE films on both sides.

  • Achilles - Protos Spacers and Ring Spacers

    Achilles – Protos Spacers and Ring Spacers

    The spacers are the interleaves placed in between the wafers for protecting the sides from scratches and particle contamination. They are made with very high pure materials offering extreme performances against the particle contamination and the o…

    The spacers are the interleaves placed in between the wafers for protecting the sides from scratches and particle contamination. They are made with very high pure materials offering extreme performances against the particle contamination and the outgassing risks.

  • Achilles - Wafer Carriers

    Achilles – Wafer Carriers

    Achilles offers a full range of wafer carriers models depending on the wafer types, all using antistatic and high-purity material, and compatible with packing machines.

    Achilles offers a full range of wafer carriers models depending on the wafer types, all using antistatic and high-purity material, and compatible with packing machines.

  • InnoLas Solutions - Linear Table Machine - LINEXO

    InnoLas Solutions – Linear Table Machine – LINEXO

    LINEXO is a versatile laser processing workstation designed for high-precision applications in the electronic, precision engineering, and photovoltaic industries.

    LINEXO is a versatile laser processing workstation designed for high-precision applications in the electronic, precision engineering, and photovoltaic industries.

  • InnoLas Solutions - Split Axis Machine - EXPEGO

    InnoLas Solutions – Split Axis Machine – EXPEGO

    EXPEGO is a laser processing workstation designed for high-precision applications in the electronic, precision engineering, and photovoltaic industries. It is mainly used for microvia drilling, cutting (routing), structuring and…

    EXPEGO is a laser processing workstation designed for high-precision applications in the electronic, precision engineering, and photovoltaic industries. It is mainly used for microvia drilling, cutting (routing), structuring and cavity formation in PCBs with typical dimensions as 610 x 460 mm and 635 x 540 mm.

  • InnoLas Solutions - Split Axis Machine - ULTAGO

    InnoLas Solutions – Split Axis Machine – ULTAGO

    ULTAGO is a powerful laser processing workstation designed for high-precision applications in the photovoltaic, precision engineering, and electronic industries. It achieves maximum throughput for solar cells or ceramic substrat…

    ULTAGO is a powerful laser processing workstation designed for high-precision applications in the photovoltaic, precision engineering, and electronic industries. It achieves maximum throughput for solar cells or ceramic substrates and is used in high-volume production environments. Different from linear table machines, in the turntable machine loading, unloading, alignment, as well as laser processing are carried out in parallel in order to reach optimum productivity.

  • KOPEL - Cell Setter - KSJ-026

    KOPEL – Cell Setter – KSJ-026

    The KOPEL KSJ-026 cell setter employs a self-alignment mechanism that enables high accuracy of ±0.05 mm to ensure stable probing of PV cells to be measured, thus achieving high repeatability of the measured data.

    The KOPEL KSJ-026 cell setter employs a self-alignment mechanism that enables high accuracy of ±0.05 mm to ensure stable probing of PV cells to be measured, thus achieving high repeatability of the measured data.

  • KOPEL - Measuring Unit - KST Series IV

    KOPEL – Measuring Unit – KST Series IV

    The light-weight, compact KOPEL KST Series 15A IV measuring unit is available in two models: the KST-P15Ce standard model, and the KST-P15HC2 which is specially designed for high-efficiency PV cells.

    The light-weight, compact KOPEL KST Series 15A IV measuring unit is available in two models: the KST-P15Ce standard model, and the KST-P15HC2 which is specially designed for high-efficiency PV cells.

  • KOPEL - Series Probe Bar

    KOPEL – Series Probe Bar

    KOPEL KSM Series probe bars enhance the measurement accuracy and repeatability of PV cell IV measurement by providing much higher precision and durability than competitors’ products.
    The KOPEL KSM Series probe bars are incorporated into the…

    KOPEL KSM Series probe bars enhance the measurement accuracy and repeatability of PV cell IV measurement by providing much higher precision and durability than competitors’ products.
    The KOPEL KSM Series probe bars are incorporated into the KOPEL KSX-1000 high-performance solar cell test system and the KSX-3000H high-efficiency solar cell test system.

  • KOPEL - Solar Module Test System - KSX-2012HM

    KOPEL – Solar Module Test System – KSX-2012HM

    A High-precision IV Test System that allows accurate measurement of IV of high-efficiency PV modules including HIT® with a 50-ms pulse light.
    It is generally believed that a stationary light or a very long pulse (several hundreds of ms or l…

    A High-precision IV Test System that allows accurate measurement of IV of high-efficiency PV modules including HIT® with a 50-ms pulse light.
    It is generally believed that a stationary light or a very long pulse (several hundreds of ms or longer) is needed to measure HIT® or similar high-efficiency PV modules. Kyoshin, however, has jointly developed an innovative test method, called the “KOPEL Method,” with Japan’s National Institute of Advanced Industrial Science and Technology (AIST).

  • KOPEL - Solar Test System - KSX - 3000H

    KOPEL – Solar Test System – KSX – 3000H

    The KSX-3000H Solar Cell Test System is an optimum solution for testing high-efficiency PV Cells including HIT® or PERC® PV cells under R&D and Mass-Production Environments.

    The KSX-3000H Solar Cell Test System is an optimum solution for testing high-efficiency PV Cells including HIT® or PERC® PV cells under R&D and Mass-Production Environments.

  • NTK Ceratec - Chuck Repair Service (6'', 8'' and 12'')

    NTK Ceratec – Chuck Repair Service (6”, 8” and 12”)

    The chuck repair service is dedicated to wafer chucks damaged in device manufacturing processes to a state equivalent to new using our vast knowledge of ceramics.

    The chuck repair service is dedicated to wafer chucks damaged in device manufacturing processes to a state equivalent to new using our vast knowledge of ceramics.

  • NTK Ceratec - Electrostatic Chuck

    NTK Ceratec – Electrostatic Chuck

    Electrostatic chucks and ceramic heaters can be produced by sintering materials with metallic electrodes arranged in the ceramics.

    Electrostatic chucks and ceramic heaters can be produced by sintering materials with metallic electrodes arranged in the ceramics.

  • NTK Ceratec - Porous Chuck

    NTK Ceratec – Porous Chuck

    The original manufacturing method enhances adhesiveness between porous sections and base sections to achieve sufficient flatness even at boundary sections.

    We can provide highly productive and reliable wafer thinning processing and manufact…

    The original manufacturing method enhances adhesiveness between porous sections and base sections to achieve sufficient flatness even at boundary sections.

    We can provide highly productive and reliable wafer thinning processing and manufacturing requiring whole surface absorption of large sized substrates.

    We offer a wide selection of porous bodies with using different materials and pore sizes to cater to user needs.

  • NTK Ceratec - Vacuum Chuck

    NTK Ceratec – Vacuum Chuck

    We can provide optimal pin chucks tailored to strict requirements through customized design using world-class flattening process technology (flatness of 0.2 μm for 12-inch chucks).

    Can flexibly be adjusted planar shapes of pin chucks with …

    We can provide optimal pin chucks tailored to strict requirements through customized design using world-class flattening process technology (flatness of 0.2 μm for 12-inch chucks).

    Can flexibly be adjusted planar shapes of pin chucks with variable unevenness according to the shapes of wafers and customize absorption zones and pin patterns to enhance absorption responsiveness:

  • Scia Systems - Ion Beam Deposition Systems - scia Coat 200 & scia Coat 500

    Scia Systems – Ion Beam Deposition Systems – scia Coat 200 & scia Coat 500

    The scia Coat 200 is designed for homogeneous coating of 200 mm substrates, such as wafers. Typical applications of the system are multilayer films for magnetic sensors or optical coatings.

    The scia Coat 500 is designed for homogeneous c…

    The scia Coat 200 is designed for homogeneous coating of 200 mm substrates, such as wafers. Typical applications of the system are multilayer films for magnetic sensors or optical coatings.

    The scia Coat 500 is designed for homogeneous coating of high precision optics. Typical applications of the system are multilayer films for X-ray mirrors and filter coatings.

  • Scia Systems - Ion Beam Etching Systems - scia Mill 150 et 200

    Scia Systems – Ion Beam Etching Systems – scia Mill 150 et 200

    The scia Mill 150 is designed for highly uniform Ion Beam Etching and Milling of single substrates up to 150 mm diameter. Carriers or wafers are loaded via an automatic handling system. The substrate holder has helium backside cooling and can be t…

    The scia Mill 150 is designed for highly uniform Ion Beam Etching and Milling of single substrates up to 150 mm diameter. Carriers or wafers are loaded via an automatic handling system. The substrate holder has helium backside cooling and can be tilted and rotated. Typical applications are the structuring of metal films for MEMS and sensors.

    The scia Mill 200 is designed for highly uniform Ion Beam Etching and Milling of wafers up to 200 mm diameter. Carriers or wafers are loaded via an automatic handling system.

  • Scia Systems - Ion Beam Trimming - scia Trim 200

    Scia Systems – Ion Beam Trimming – scia Trim 200

    The scia Trim 200 is designed for high precision film thickness trimming in wafer processing. Typical applications of the system are frequency and thickness trimming in manufacturing of acousto-electrical devices and filters such as bulk acousti…

    The scia Trim 200 is designed for high precision film thickness trimming in wafer processing. Typical applications of the system are frequency and thickness trimming in manufacturing of acousto-electrical devices and filters such as bulk acoustic wave (BAW) or surface acoustic wave (SAW) devices, localized pole trimming for thin film heads (TFH) and trimming of precision thin film resistors.

    The scia Trim 200 is a high volume production system and accommodates a standard semiconductor cassette handling robot. Cluster tools with two process chambers and two cassette load-locks are available.

  • Scia Systems - Magnetron Sputtering Systems - scia Magna 200 and scia Multi 680

    Scia Systems – Magnetron Sputtering Systems – scia Magna 200 and scia Multi 680

    The scia Magna 200 uses a unique Double Ring Magnetron architecture to achieve very high homogeneity of coatings at impressively high deposition rates. Typical applications include piezoelectric layers, optical coatings and passivation layers.

    The scia Magna 200 uses a unique Double Ring Magnetron architecture to achieve very high homogeneity of coatings at impressively high deposition rates. Typical applications include piezoelectric layers, optical coatings and passivation layers.

    The scia Multi 680 is designed for periodic multilayer coatings for substrates up to 650 mm dia. and 50 kg. Typical applications are gradient multilayer coatings of mirrors for soft X‑ray and anti-reflective coatings in UV and X‑ray applications.

  • Scia Systems - PEVCD/RIE Systems - scia Batch 350

    Scia Systems – PEVCD/RIE Systems – scia Batch 350

    The scia Batch 350 is designed for homogeneous coating of several 3‑dimensional shaped substrates in one batch. Typical applications are biocompatible films for medical objects.

    The scia Batch 350 is designed for homogeneous coating of several 3‑dimensional shaped substrates in one batch. Typical applications are biocompatible films for medical objects.

  • Scia Systems - PEVCD/RIE Systems - scia Cube 300/750

    Scia Systems – PEVCD/RIE Systems – scia Cube 300/750

    The scia Cube 300/750 are designed for large area high density plasma processes of substrates up to 300 mm x 200 mm (scia Coat 300) and up to 750 mm x 750 mm (scia Coat 750). Typical applications are deposition of Diamond Like Carbon (DLC) for o…

    The scia Cube 300/750 are designed for large area high density plasma processes of substrates up to 300 mm x 200 mm (scia Coat 300) and up to 750 mm x 750 mm (scia Coat 750). Typical applications are deposition of Diamond Like Carbon (DLC) for optical filters and dielectric films for anti-reflective coatings as well as etching processes with oxygen or halogen chemistry for the structuring of Semiconductors and metals.

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